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NOTICE 02-06-2016:
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Si2 is the largest organization of industry-leading semiconductor, systems, EDA and manufacturing companies focused on the development and adoption of standards and shared R&D collaboration to improve the way integrated circuits are designed and manufactured.

Now in its 27th year, Si2 is uniquely positioned to enable timely collaboration through dedicated staff and a strong implementation focus driven by its member companies. Si2 represents over 90 companies involved in all parts of the silicon supply chain throughout the world.


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2015-10-06 19th Si2CON Presentations Available
2015-09-29 Si2 Announces Agenda and Speakers for 19th Si2 Conference (PR)
2015-09-24 Lapses in IC Security Can “Make or Break” Technology Infrastructure Protection (PR)
2015-08-11 Si2 Names New Staff in OpenStandards and Membership (PR)
2015-06-07 Si2 at DAC 2015: Booth Presentations
2015-05-27 Si2 Announces Board of Directors for 2015-2016 (PR)
2015-02-19 SI2’s Compact Model Coalition Releases New SPICE Model Standards for Fully Depleted Silicon- On-Insulator (FDSOI) MOSFET Technologies (PR)




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  Latest Resources Posted for Download (See More)

oa22.50p036 posted    Si2 Admin - 2016-01-25 10:01   [OpenAccess Releases]
oa22.50p036, an Incremental Source Release, has been posted. This release is available to OAC members only.

oa22.43p054 posted    Si2 Admin - 2015-12-15 16:15   [OpenAccess Releases]
oa22.43p054, an Incremental Source Release, has been posted. This release is available to OAC members only.

CMC_Diode 2.0.0: Documentation Updated   Si2 Admin - 2015-12-07 10:35   [CMC Public Distributions]
The Diode_CMC 2.0.0 release has been updated with a rev2 of the documents: Recovery_Model_in_Diode_CMC_ver200_lev2002_rev2.pdf Download requires a user login.

LEF DEF v5.8p005 Format Specification Posted   Si2 Admin - 2015-11-13 10:23   [Lef/Def Exchange Format Ver5.8 and Above]
Updated Documentation for the LEF/DEF API Format Specification Version 5.8 P005: The updates in this LEF DEF API Format Specification reference document support new process nodes trim metal shape concepts. A new masterslice layer with type property of TRIMMETAL is introduced in LEF. Shapes on that layer are written out in FILLS section in DEF, and some related shapes are written out using reserved net name in SPECIALNETS section.

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